1.

Conference Proceedings
Conference Proceedings
1. Investigation of the Time - Delay Effect on the Critical Dimension of Tungsten Slilcide/Polysilicon Gate after Reactive Ion Etching
Lin, S-P. ; Ou, C-H. ; Lee, Sz. ; Tien, Y-C. ; Hsu, C-F.
Pub. info.: Plasma etching processes for sub-quarter micron devices : proceedings of the international symposium.  pp.186-192,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-30
2.

Conference Proceedings
Conference Proceedings
2. A Model for the Impact of Chamber Wall Condition on Oxide Etch Rate and Particle Performance
Liu, C-C. ; Lee, S. ; Tai, S-K. ; Tien, Y-C. ; Hsu, C-F. ; Su, J.
Pub. info.: Proceedings of the twelfth International Symposium on Plasma Processing.  pp.165-171,  1998.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 98-4
3.

Conference Proceedings
Conference Proceedings
3. In Situ Spectroscopic Diagnostics of the Influence of Chamber Wall Polymer on Oxide Etch Rate
Lee, S. ; Tien, Y-C. ; Hsu, C-F.
Pub. info.: Plasma deposition and treatment of polymers : symposium held November 30-December 2, 1998, Boston, Massachusetts, U.S.A..  pp.197-,  1999.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 544