1.

Conference Proceedings
Conference Proceedings
1. VUV spectrophotometry for photomasks characterization at 193 nm [5965-59]
Yang, M. ; Leiterer, J. ; Gatto, A. ; Kaiser, N. ; Hollein, I. ; Teuber, S. ; Bubke, K.
Pub. info.: Optical fabrication, testing and metrology II : 13-15 September 2005, Jena, Germany.  pp.59651L-,  2005.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5965
2.

Conference Proceedings
Conference Proceedings
2. Study of stress birefringence for 1 93-nm immersion photomasks [5853-02]
Cotte, E. ; Selle, M. ; Bubke, K. ; Teuber, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.10-19,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Influence of mask manufacturing process on printing behavior of angled line structures [6154-168]
Teuber, S. ; Durr, A. C. ; Herguth, H. ; Kunkel, G. ; Wandel, T. ; Zell, T.
Pub. info.: Optical Microlithography XIX.  pp.61544C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Limitations of optical reticle inspection for 45-nm node and beyond [6349-29]
Teuber, S. ; Bzdurek, A. ; Durr, A. C. ; Heumann, J. ; Holfeld, C.
Pub. info.: Photomask Technology 2006.  pp.63490T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
5.

Conference Proceedings
Conference Proceedings
5. First results from AIMS beta tool for 157-nm lithography
Teuber, S. ; Higashikawa, I. ; Urbach, J.-P. ; Schilz, C.M. ; Koehle, R. ; Zibold, A.M.
Pub. info.: Optical Microlithography XVII.  pp.1648-1657,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Determination of mask induced polarization effects on AltPSM mask structures [5853-106]
Hollein, I. ; Teuber, S. ; Bubke, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.194-201,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
7.

Conference Proceedings
Conference Proceedings
7. Patterning of Ta/Si02 high transmission EAPSM material for 193nm technology [5853-26]
Koepernik, C. ; Becker, H. W. ; Butschke, J. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Schmidt, F. ; Teuber, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.463-473,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. Pellicle choice for 193-nm immersion lithography photomasks
Cotte, E. P. ; HaBler, R. ; Utess, B. ; Antesberger, G. ; Kromer, F. ; Teuber, S.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.511-520,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567