1.

Conference Proceedings
Conference Proceedings
1. Challenges and solutions for trench lithography beyond 65nm node [6156-60]
Lu, Z. ; Ho, C.-C. ; Mason, M. ; Anderson, A. ; Mckee, R. ; Jackson, R. ; Zhu, C. ; Terry, M.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.615617-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
2.

Conference Proceedings
Conference Proceedings
2. Improving asymmetric printing and low margin using custom illumination for contact hole lithography [6156-62]
Jessen, S ; Terry, M. ; Mason, M. ; O’Brien, S. ; Soper, R. ; Yarbrough, W. ; Wolf, T.
Pub. info.: Design and process integration for microelectronic manufacturing IV : 23-24 February, 2006, San Jose, California, USA.  pp.615616-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6156
3.

Conference Proceedings
Conference Proceedings
3. Resist blur and line edge roughness (Invited Paper)
Zhang, G. ; Terry, M. ; O'Brien, S. ; Soper, R. ; Mason, M. ; Kim, W. ; Wang, C. ; Hansen, S. ; Lee, J. ; Ganeshan, J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.38-52,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. Design rule considerations for 65-nm node contact using off axis illumination
Jessen, S. ; Mason, M. ; O'Brien, S. ; Terry, M. ; Soper, R. ; Wolf, T.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.274-284,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
5.

Conference Proceedings
Conference Proceedings
5. Finding the needle in the haystack: using full-chip process window analysis to qualify competing SRAF placement strategies for 65 nm [6349-70]
Mason, M. ; Best, S. ; Zhang, G. ; Terry, M. ; Soper, R.
Pub. info.: Photomask Technology 2006.  pp.63491X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349