1.

Conference Proceedings
Conference Proceedings
1. Billion-level durable ArF excimer laser with highly stable energy
Wakabayashi,O. ; Enami,T. ; Ohta,T. ; Tanaka,H. ; Kubo,H. ; Suzuki,T. ; Terashima,K. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1058-1068,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Highly durable low CoO mass production version of 2-kHz ArF excimer laser for DUV lithography
Enami,T. ; Wakabayashi,O. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1435-1444,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Output stabilization technology With chemical impurity control on ArF excimer laser
Sumitani,A. ; Andou,S. ; Watanabe,T. ; Konishi,M. ; Egawa,S. ; Uchino,I. ; Ohta,T. ; Terashima,K. ; Suzuki,N. ; Enami,T. ; Mizoguchi,H.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1424-1434,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Luminescence centers in high-energy ion-implanted silicon
Terashima,K. ; Ikarashi,T. ; Watanabe,M. ; Kitano,T.
Pub. info.: Defects in semiconductors, icds-19 : proceedings of the 19th International Conference on Defects in Semiconductors, Aveiro, Portugal, July 1997.  Part1  pp.587-592,  1997.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 258-263
5.

Conference Proceedings
Conference Proceedings
5. Photoluminescence of Ring-Distribution of Oxygen Precipitates in Czochralski Silicon
Terashima,K. ; Ikarashi,T. ; Ono,H. ; Tajima,M.
Pub. info.: Proceedings of the 18th International Conference on Defects in Semiconductors : ICDS-18, Sendai, Japan, July 23-28, 1995.  pp.1129-1134,  1995.  Zurich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 196-201
6.

Conference Proceedings
Conference Proceedings
6. High-repetition-rate ArF excimer laser for microlithography
Wakabayashi,O. ; Enami,T. ; Ishii,K. ; Terashima,K. ; Itakura,Y. ; Watanabe,T. ; Ohta,T. ; Ohbu,A. ; Kubo,H. ; Tanaka,H. ; Andou,S. ; Matsunga,T. ; Umeda,H. ; Suzuki,T. ; Sumitani,A. ; Mizoguchi,H.
Pub. info.: First International Symposium on Laser Precision Microfabrication : 14-16 June 2000, Omiya, Saitama, Japan.  pp.191-194,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4088
7.

Conference Proceedings
Conference Proceedings
7. Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography
Saito,T. ; Matsunaga,T. ; Mitsuhashi,K. ; Terashima,K. ; Ohta,T. ; Tada,A. ; Ishihara,T. ; Yoshino,M. ; Tsushima,H. ; Enami,T. ; Tomaru,H. ; Igarashi,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.1229-1237,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. 1-kHz 5-W ArF excimer laser for microlithography with highly narrow 0.7-pm bandwidth and issues on durability related to optical damage
Enami,T. ; Ohta,T. ; Tanaka,H. ; Kubo,H. ; Suzuki,T. ; Sunaka,F. ; Terashima,K. ; Sumitani,A. ; Kawasa,Y. ; Wakabayashi,O. ; Mizoguchi,H.
Pub. info.: Laser-Induced Damage in Optical Materials: 1998.  pp.31-42,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3578