1.

Conference Proceedings
Conference Proceedings
1. Nanometer-level metrology with a low-voltage CD SEM
Yoshimura,T. ; Ezumi,M. ; Otaka,T. ; Todokoro,H. ; Yamamoto,J. ; Terasawa,T.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.61-70,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Subwavelength optical lithography
Terasawa,T.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.8-16,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
3.

Conference Proceedings
Conference Proceedings
3. Automated method to check sidelobe overlap projected by adjacent apertures in attenuated phase-shift masks
Nakajo,K. ; Sakemi,J. ; Moniwa,A. ; Terasawa,T. ; Hasegawa,N. ; Tsujimoto,E.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.154-162,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
4.

Conference Proceedings
Conference Proceedings
4. Mechanical property of organic resists for ArF lithography
Morisawa,T. ; Tanaka,T.P. ; Terasawa,T.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.992-999,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
5.

Conference Proceedings
Conference Proceedings
5. Printing characteristics of proximity x-ray lithography and comparison with optical lithography for 100-nm node and below
Hasegawa,M. ; Nakayama,Y. ; Yamaguchi,K. ; Terasawa,T. ; Matsui,Y.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.96-104,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997
6.

Conference Proceedings
Conference Proceedings
6. Optical system for high-throughput EUV lithography
Katagiri,S. ; Ito,M. ; Yamanashi,H. ; Seya,E. ; Terasawa,T.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.34-45,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
7.

Conference Proceedings
Conference Proceedings
7. Effects of radially nonsymmetric pupil filters and multiple-pupil exposure
Bunau,R.M.von ; Fukuda,H. ; Terasawa,T.
Pub. info.: Optical Microlithography IX.  Part1  pp.375-385,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726