1.

Conference Proceedings
Conference Proceedings
1. Multiple-nonvolatile acetal (MANA) resists
Guevremont,J.M. ; Brainard,R.L. ; Reeves,S.D. ; Zhou,X. ; Nguyen,T.B. ; Mackevich,J.F. ; Anderson,E.H. ; Taylor,G.N.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.255-267,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Practical resists for 193-nm lithography using 2.38% TMAH:physicochemical influences on resist performance
Szmanda,C.R. ; Yu,J. ; Barclay,G.G. ; Cameron,J.F. ; Kavanagh,R.J. ; Blacksmith,R.F. ; III,P.Trefonas ; Taylor,G.N.
Pub. info.: Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California.  pp.65-75,  1997.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3049
3.

Conference Proceedings
Conference Proceedings
3. Optimization of DUV chemically amplified resist platforms for SCALPEL e-beam exposure
Ocola,L.E. ; Blakey,M.I. ; Orphanos,P.A. ; Li,W.-Y. ; Novembre,A.E. ; Brainard,R.L. ; Mackevich,J.F. ; Taylor,G.N.
Pub. info.: Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA.  pp.194-203,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3997