1.

Conference Proceedings
Conference Proceedings
1. The Influence of Process Parameters on Forged Magnesium Alloys
Chan, C.F. ; Yong, M.S. ; Tay, C.J. ; Shang, H.M.
Pub. info.: Advanced materials processing II : proceedings of the 2nd International Conference on Advanced Materials Processing, Grand Hyatt, Singapore, 2nd-4th December 2002.  pp.427-430,  2003.  Uetikon-Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 437-438
2.

Conference Proceedings
Conference Proceedings
2. Dipole options for 90-nm lithography technologies and below
Chua, G.S. ; Tay, C.J. ; Quan, C. ; Lin, Q. ; Chua, L.-H.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1284-1295,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Impact of transmission error for attenuated phase-shift mask for 0.10-μm technology
Tan, S.K. ; Lin, Q. ; Quan, C. ; Tay, C.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1062-1069,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Sub-0.10-μm lithography technology with resolution enhancement technique
Chua, G.S. ; Lin, Q. ; Tay, C.J. ; Quan, C.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1563-1574,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. MEF studies for attenuated phase-shift mask for sub-0.13-μm technology using 248 nm
Tan, S.K. ; Lin, Q. ; Chua, G.S. ; Quan, C. ; Tay, C.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1366-1372,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Rigorous diffraction analysis using geometrical theory of diffraction for future mask technology
Chua, G.S. ; Tay, C.J. ; Quan, C. ; Lin, Q.
Pub. info.: Optical Microlithography XVII.  pp.1267-1278,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Vibration measurement of microcomponents by fringe projection method
Wu, T. ; Tay, C.J. ; Quan, C. ; Wang, S. ; Shang, H.M.
Pub. info.: Smart Sensors, Actuators, and MEMS.  2  pp.912-923,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5116
8.

Conference Proceedings
Conference Proceedings
8. Shear ESPI with small-objects
Sirohi, R.S. ; Tay, C.J. ; Shang, H.M. ; Boo, W.P.
Pub. info.: International Conference on Applied Optical Metrology.  pp.332-337,  1998.  Bellingham, Wash..  SPIE--International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3407
9.

Conference Proceedings
Conference Proceedings
9. Digital shearography for slope measurement
Shang, H.M. ; He, Y.M. ; Tay, C.J.
Pub. info.: International Conference on Applied Optical Metrology.  pp.304-309,  1998.  Bellingham, Wash..  SPIE--International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3407