1.

Conference Proceedings
Conference Proceedings
1. Development of next-generation mask inspection method by using the feature of mask image captured with 199-nm inspection optics [6349-138]
Tsuji, Y. ; Kikuiri, N. ; Murakami, S. ; Takahara, K. ; Isomura, I. ; Tamura, Y. ; Yamashita, K. ; Hirano, R. ; Tateno, M. ; Matsumura, K. ; Takayama, N. ; Usuda, K.
Pub. info.: Photomask Technology 2006.  pp.63493M-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
2.

Conference Proceedings
Conference Proceedings
2. Inspection capability of high-transmittance HTPSM and OPC masks for ArF lithography
Tateno, M. ; Takayama, N. ; Murakami, S. ; Hatta, K. ; Akima, S. ; Matsuo, F. ; Otaki, M. ; Kim, B.-G. ; Tanaka, K. ; Yoshioka, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.446-453,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. DUV inspection capability for 90-nm node mask in ArF lithography
Ohira, K. ; Kim, B.G. ; Tanaka, K. ; Yoshioka, N. ; Tateno, M. ; Takayama, N. ; Murakami, S. ; Hatta, K. ; Akima, S. ; Matsuo, F. ; Otaki, M.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1181-1190,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
4.

Conference Proceedings
Conference Proceedings
4. Photomask quality assessment solution for 90-nm technology node
Ohira, K. ; Chung, D.H.P. ; Nobuyuki, Y. ; Tateno, M. ; Matsumura, K. ; Chen, J.-H. ; Luk-Pat, G.T. ; Fukui, N. ; Tanaka, Y.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.364-374,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond (Invited Paper) [6283-130]
Kikuiri, N. ; Murakami, S. ; Tsuchiya, H. ; Tateno, M. ; Takahara, K. ; Imai, S. ; Hirano, R. ; Isomura, I. ; Tsuji, Y. ; Tamura, Y. ; Matsumura, K. ; Usuda, K. ; Otaki, M. ; Suga, O. ; Ohira, K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283