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18 results

Conference Proceedings

1. REMOTE PLASMA CLEANING AND ION-INDUCED HYDROGEN DESORPTION FROM THE SILICON (100) SURFACE AND ITS APPLICATIONS TO Si EPITAXY

Kinosky, David S. ; Qian, R. ; Mahajan, A. ; Thomas, S. ; Fretwell, J. ; Munguia, P. ; Banerjee, S. ; Tasch, A.

Pub. info.:	Beam-solid interactions : fundamentals and applications : symposium held November 30-December 4, 1992, Boston, Massachusetts, U.S.A.. pp.831-836, 1993. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	279

Conference Proceedings

2. THE DEPENDENCE OF DEFECT DENSITY IN GeXSi1-X/Si HETEROSTRUCTURES GROWN BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION ON DEPOSITION PARAMETERS

Kinosky, D. ; Qian, R. ; Hsu, T. ; Irby, J. ; Mahajan, A. ; Thomas, S. ; Banerjee, S. ; Tasch, A. ; Magee, C. ; Grove, C. L.

Pub. info.:	Mechanisms of Heteroepitaxial growth : symposium held April 27-30, 1992, San Francisco, California, U.S.A.. pp.445-450, 1992. Pittsburgh, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	263

Conference Proceedings

3. GROWTH AND HIGH RESOLUTION TEM CHARACTERIZATION OF Ge Si1-x/Si HETERO-STRUCTURES BY REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Qian, R. ; Chung, I. ; Kinosky, D. ; Hsu, T. ; Irby, J. ; Mahajan, A. ; Thomas, S. ; Banerjee, S. ; Tasch, A. ; Rabenberg, L. ; Grove, C. ; Magee, C.

Pub. info.:	Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A.. pp.353-360, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	236

Conference Proceedings

4. HYDROGEN PASSIVATION OF Si (100) BY REMOTE HYDROGEN PLASMA TREATMENT

Hsu, T. ; Anthony, B. ; Breaux, L. ; Qian, R. ; Baner-jee, S. ; Tasch, A. ; Lin,. S. ; Marcus, H. L.

Pub. info.:	Plasma processing and synthesis of materials III : symposium held April 17-19, 1990, San Francisco, California, U.S.A.. pp.279-284, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	190

Conference Proceedings

5. THE IMPACT OF DEVICE ASYMMETRY ON THE ELECTRICAL AND RELIABILITY PROPERTIES OF FERROELECTRIC PZT FOR MEMORY APPLICATIONS

Kim., Jiyoung ; Sudhama, C. ; Chikarmane, Vinay ; Khamankar, Rajesh ; Lee, Lack ; Tasch, A.

Pub. info.:	Materials reliability in microelectronics II : symposium held April 27-May 1, 1992, San Francisco, California, U.S.A.. pp.313-318, 1992. Pittsburgh, PA. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	265

Conference Proceedings

6. HETEROEPITAXY OF Si/Si1-xGex GROWN BY REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION

Hsu, T. ; Qian, R. ; Kinosky, D. ; Irby, J. ; Anthony, B. ; Banerjee, S. ; Tasch, A. ; Magee, C.

Pub. info.:	Low energy ion beam and plasma modification of materials : symposium held April 30-May 2, 1991, Anaheim, California, U.S.A.. pp.223-228, 1991. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	223

Conference Proceedings

7. RHEED OBSERVATIONS OF SILICON (100) SURFACE RECONSTRUCTION AFTER REMOTE HYDROGEN PLASMA CLEANING

Hsu, T. ; Breaux, L. ; Anthony, B. ; Banerjee, S. ; Tasch, A.

Pub. info.:	Rapid thermal annealing/chemical vapor deposition and integrated processing : sympoisium held April 25-28, 1989, San Diego, California, U.S.A.. pp.161-166, 1989. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	146

Conference Proceedings

8. *REACTION KINETICS OF EPITAXIAL SILICON DEPOSITION AT 200-400o USING REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

Anthony, B. ; Hsu, T. ; Breaux, L. ; Banerjee, S. ; Tasch, A.

Pub. info.:	Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A.. pp.145-150, 1990. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	165

Conference Proceedings

9. REMOTE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF EPITAXIAL SILICON ON SILICON (100) AT 150oC

Hsu, T. ; Anthony, B. ; Breaux, L. ; Banerjee, S. ; Tasch, A.

Pub. info.:	Characterization of plasma-enhanced CVD processes : symposium held Novermber 27-28, 1989, Boston, Massachusetts, U.S.A.. pp.139-144, 1990. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	165

10.

Conference Proceedings

10. THE ROLE OF THE LEAD ZIRCONATE TITANATE (PZT)-Pt INTERFACE IN THE ANOMALOUS PHASE TRANSFORMATION KINETICS IN SPUTTERED PZT THIN FILM CAPACITORS AT SUB-2000 A THICKNESS

Chikarmane, V. ; Kim, J. ; Sudhama, C. ; Lee, J. ; Tasch, A. ; Novak, S.

Pub. info.:	Ferroelectric thin films II : symposium held December 2-4, 1991, Boston, Massachusetts, U.S.A.. pp.367-372, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	243

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Author: Tasch, A.