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Conference Proceedings

1. New repair of clear defects on half-tone PSM using Ga implantation

Nagamura, Y. ; Kanai, I. ; Tange, K. ; Hosono, K. ; Hayashi, K. ; Ikeda, H. ; Nagashige, S. ; Ishijima, M. ; Iwasaki, H. ; Kikuchi, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.466-475, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

2. Improvement of critical dimension stability of chemically amplified resist by overcoat II

Kumada, T. ; Tange, K. ; Maetoko, K. ; Hosono, K. ; Tsuzuki, M. ; Yonetani, K. ; Terada, R. ; Nakashiba, Y. ; Anzai, S. ; Kikuchi, Y.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.101-106, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

3. Fabrication of MoSiON halftone masks using ZEP7000 for MEBES 4500

Maetoko, K. ; Tange, K. ; Fukuma, H. ; Yoshioka, N. ; Kawada, S. ; Ishizuka, M. ; Sasaki, T. ; Sauer, C. A.

Pub. info.:	Photomask and X-Ray Mask Technology VI. pp.350-357, 1999. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3748

Conference Proceedings

4. Approximate method of mask flatness factor in focus deviation [6283-81]

Maejima, S. ; Shirai, S. ; Imai, A. ; Nakao, S. ; Tange, K. ; Chiba, A. ; Hosono, K. ; Narimatsu, K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62833A-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283