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35 results

Conference Proceedings

1. Overlay and critical dimension control in 100-nm ULSI processes using TaBN x-ray masks and the XRA x-ray stepper

Fujii,K. ; Tanaka,Y. ; Iwanoto,T. ; Tsuboi,S. ; Sumitani,H. ; Taguchi,T. ; Suzuki,K. ; Matsui,Y.

Pub. info.:	Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA. pp.155-163, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4343

Conference Proceedings

2. Photocantilever:an integrated microprobe for near-field optical microscopy

Fukuzawa,K. ; Tanaka,Y. ; Kuwano,H. ; Yoshikawa,H. ; Ohkubo,T. ; Kato,T.

Pub. info.:	Near-field optics : physics, devices, and information processing : 22-23 July 1999, Denver, Colorado. pp.21-31, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3791

Conference Proceedings

3. Electron Momentum Density Distribution in Lithium:Analysis by the Maximum Entropy Method

Dobrzyfiski,L. ; Tanaka,Y. ; Sakurai,Y.

Pub. info.:	Positron annihilation, ICPA-11 : Proceedings of the 11th International Conference on Positron Annihilation, Kansas City, Missouri, USA, May 1997. pp.150-155, 1997. Zuerich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	255-257

Conference Proceedings

4. Design of high-performance chemically amplified resist

Niinomi,T. ; Tomiyasu,H. ; Kameyama,Y. ; Tsukamoto,M. ; Tanaka,Y. ; Fujita,J. ; Shimomura,S. ; Ochiai,T.

Pub. info.:	Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California. pp.174-185, 1996. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2724

Conference Proceedings

5. High-performance profiles and characteristics of a chemically amplified resist

Mochizuki,H. ; Tomiyasu,H. ; Kameyama,Y. ; Tsukamoto,M. ; Niinomi,T. ; Tanaka,Y. ; Fujita,J. ; Ochiai,T.

Pub. info.:	Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California. Part 2 pp.953-959, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3333

Conference Proceedings

6. Josephson effect and quasi-particle states in d-wave superconductors

Tanaka,Y. ; Kashiwaya,S.

Pub. info.:	Spectroscopic Studies of Superconductors Part B : Tunneling,Photoelectron,and Other Spectra : 29 January - 1 February 1996, San Jose, California. PartB pp.468-476, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2696

Conference Proceedings

7. Generation of Tunable Pulses Shorter Than 345 fs from a Passively Mode-Locked Fiber Ring Laser with Bulk Components,

Endo,M. ; Tanaka,Y.

Pub. info.:	Optics for science and new technology : 17th Congress of the International Commission for Optics, August 19-23, 1996, Hotel Riviera(Yusong), Taejon Korea. Part2 pp.664-665, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2778

Conference Proceedings

8. Environmentally stable chemically amplified resist

Kameyama,Y. ; Tomiyasu,H. ; Tsukamoto,M. ; Niinomi,T. ; Tanaka,Y. ; Fujita,J. ; Ochiai,T. ; Uedono,A. ; Tanigawa,S.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.238-247, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

9. X-ray stepper development for volume production at Canon

Uda,K. ; Mizusawa,N. ; Tanaka,Y. ; Watanabe,Y. ; Ina,H. ; Uzawa,S.

Pub. info.:	Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California. pp.689-697, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3331

10.

Conference Proceedings

10. TuA2:L/G recording with 0.45-ｦﾌm track pitch in CAD-MSR｡ｦdisk.

Murakami,Y. ; Maeda,S. ; Takahashi,A. ; Tanaka,Y. ; Watanabe,T.

Pub. info.:	ISOM/ODS '99 : joint international symposium on Optical Memory and Optical Data Strage 1999, 11-15 July 1999 Sheraton Kauai Resort, Koloa, Howaii. pp.69-71, 1999. Bellingham, Washington. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3864

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