1.

Conference Proceedings
Conference Proceedings
1. Exposure tool chuck flatness study and effects on lithography
Mukherjee-Roy,M. ; Tan,C.H. ; Tan,Y.K. ; Samudra,G.S.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.14-25,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of overlay performance by using air shower at the prealignment
Ghosh,A. ; Tan,Y.K. ; Rajan,D.A. ; Sun,G.P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.109-113,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
3.

Conference Proceedings
Conference Proceedings
3. W-CMP alignment using ASML's ATHENA system on an I-line stepper
Prasad,K.J. ; Rajan,D.A. ; Tan,Y.K. ; Sun,G.P. ; Morgan,S. ; Phillips,M. ; Ng,B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.79-88,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
4.

Conference Proceedings
Conference Proceedings
4. Improvement in E2 nozzle performance: no imprint and less contamination
Ang,K.S. ; Low,S.J. ; Lim,A.C. ; Lim,C.K. ; Loh,L.K. ; Tan,Y.K. ; Xu,X.Y.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.282-288,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
5.

Conference Proceedings
Conference Proceedings
5. Wafer edge dies yield improvements
Gan,K.H.P. ; Tan,Y.K. ; Sun,G.P.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.274-281,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344