1.

Conference Proceedings
Conference Proceedings
1. Enrichment and Characterization of Metal Endohedral C60
Kubozono, Y. ; Takabayashi, Y. ; Hiraoka, K. ; Nakai, T. ; Ohta, T. ; Maeda, H. ; Kashino, S.
Pub. info.: Proceedings of the Symposium on Recent Advances in the Chemistry and Physics of Fullerenes and Related Materials.  pp.390-400,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-14
2.

Conference Proceedings
Conference Proceedings
2. Structure and Physical Properties of Cs and Na Doped Fullerides.
Kubozono, Y. ; Fujiki, S. ; Takabayashi, Y. ; Kashino, S. ; twasa, Y.
Pub. info.: Fullerenes 2000 : chemistry and physics of fullerenes and carbon nanomaterials, proceedings of the International Symposium.  pp.173-179,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-12
3.

Conference Proceedings
Conference Proceedings
3. Performance of liquid xenon jet laser-produced-plasma light source for EUV lithography
Suganuma, T. ; Abe, T. ; Komori, H. ; Takabayashi, Y. ; Endo, A.
Pub. info.: Fifth International Symposium on Laser Precision Microfabrication : 11-14 May, 2004, Nara, Japan.  pp.367-372,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5662
4.

Conference Proceedings
Conference Proceedings
4. Step and repeat UV-nanoimprint lithography using a large area stamp
Soumagne, G. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Nakano, M. ; Komori, H. ; Takabayashi, Y. ; Ariga, T. ; Ueno, Y. ; Wada, Y. ; Endo, A. ; Toyoda, K.
Pub. info.: Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA.  pp.227-235,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5751
5.

Conference Proceedings
Conference Proceedings
5. Design of high-average-power clean EUV light source based on laser-produced Xenon plasma
Endo, A. ; Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Masaki, N. ; Soumagne, G. ; Komori, H. ; Takabayashi, Y. ; Mizoguchi, H.
Pub. info.: Laser-generated and other laboratory X-ray and EUV sources, optics, and applications : 4-6 August 2003, San Diego, California, USA.  pp.256-262,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5196
6.

Conference Proceedings
Conference Proceedings
6. Development of C02 laser produced Xe plasma EUV light source for microlithography [6151-27]
Mizoguchi, H. ; Endo, A. ; Arigo, T. ; Miura, T. ; Hoshino, H. ; Ueno, Y. ; Nakano, M. ; Komori, H. ; Sumitani, A. ; Abe, T. ; Suganuma, T. ; Soumagne, G. ; Someya, H. ; Takabayashi, Y. ; Toyoda, K.
Pub. info.: Emerging Lithographic Technologies X.  pp.61510S-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6151
7.

Conference Proceedings
Conference Proceedings
7. Performance of a 10-kHz laser-produced-plasma light source for EUV lithography
Abe, T. ; Suganuma, T. ; Imai, Y. ; Someya, H. ; Hoshino, H. ; Nakano, M. ; Soumagne, G. ; Komori, H. ; Takabayashi, Y. ; Mizoguchi, H. ; Endo, A. ; Toyoda, K. ; Horiike, Y.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.160-167,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374