1.

Conference Proceedings
Conference Proceedings
1. Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era
T.-S. Eom ; J.-T. Park ; J.-H. Kang ; S. Park ; S. Koo
Pub. info.: Optical Microlithography XXI.  1  pp.69240H-1-69240H-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924
2.

Conference Proceedings
Conference Proceedings
2. Study on imaging characterization of ArF high index immersion lithography
S. Park ; J.-T. Park ; K. Lee ; T.-S. Eom ; J.-S. Kim
Pub. info.: Lithography Asia 2008.  1  pp.71401K-1-71401K-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
3.

Conference Proceedings
Conference Proceedings
3. The analysis of optical lithography at 2-dimensional dense structure
C. Park ; T.-S. Eom ; H. Shin ; K. Yang ; J. Choi
Pub. info.: Optical Microlithography XXI.  3  pp.69244V-1-69244V-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924