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Conference Proceedings

1. Simulation on Nanostructured Metals Based on Multiscale Crystal Plasticity Considering Effect of Grain Boundary

Y. Aoyagi ; T. Shimokawa ; K. Shizawa ; Y. Kaji

Pub. info.:	THERMEC 2011 : International Conference on Processing & Manufacturing of Advanced Materials : processing, fabrication, properties, applications, August 1-5, 2011, Quebec City, Canada. pp.1751-1756, 2012. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	706-709

Conference Proceedings

2. Effect of Grain Boundaries on Fracture Toughness in Ultrafine-Grained Metals by Atomic-Scale Computational Experiments

T. Shimokawa ; M. Tanaka ; K. Higashida

Pub. info.:	THERMEC 2011 : International Conference on Processing & Manufacturing of Advanced Materials : processing, fabrication, properties, applications, August 1-5, 2011, Quebec City, Canada. pp.1841-1846, 2012. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	706-709

Conference Proceedings

3. The Effect of Severe Plastic Deformation on the Brittle-Ductile Transition in Low Carbon Steel

M. Tanaka ; K. Higashida ; T. Shimokawa

Pub. info.:	Ductility of bulk nanostructured materials : Special topic volume, invited papers only. pp.471-482, 2010. Aedermannsdorf, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	633-634

Conference Proceedings

4. Atomic Simulations on the Grain Subdivision of a Crystalline Metal

T. Shimokawa ; T. Kinari ; S. Shintaku

Pub. info.:	PRICM 6 : selected, peer reviewed papers from The sixth Pacific Rim International Conference on Advanced Materials and Processing, November 5-9, 2007, ICC Jeju, Jeju Island, Korea. 561-565 pp.1983-1986, 2007. Uetikon-Zuerich. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	561-565

Conference Proceedings

5. Various factors of the image blur in chemically amplified resist

T. Kawakami ; T. Nagai ; Y. Nishimura ; M. Shima ; S. Kusumoto ; T. Shimokawa

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

6. High-performance 193nm photoresists based on fluorosulfonamide

W. Li ; K. Chen ; R. Kwong ; M. C. Lawson ; M. Khojasteh ; I. Popova ; P. R. Varanasi ; T. Shimokawa ; Y. Yamaguchi ; S. Kusumoto ; M. Sugiura ; T. Kawakami ; M. Slezak ; G. Dabbagh ; Z. Liu

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

7. Novel developers for positive tone EUV photoresists

G. Sharma ; S. Sharma ; M. Rattner ; R. P. Meagley ; M. Tanaka ; T. Shimokawa ; H. Sugita ; T. Wang ; A. Shiota

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

Conference Proceedings

8. High refractive index materials design for the next generation ArF immersion lithography

T. Furukawa ; T. Kishida ; K. Yasuda ; T. Shimokawa ; Z. Liu

Pub. info.:	Optical Microlithography XXI. 1 pp.692412-1-692412-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6924

Conference Proceedings

9. Process optimization for developer soluble immersion topcoat material

H. Nakagawa ; K. Goto ; M. Shima ; J. Takahashi ; T. Shimokawa ; K. Ichino ; N. Nagatani ; H. Kyoda ; K. Yoshihara

Pub. info.:	Advances in resist materials and processing technology XXIV. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6519

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Conference Proceedings

10. Dependence of acid generation efficiency on acid molecular structure and concentration of acid generator in chemically amplified EUV resist

R. Hirose ; T. Kozawa ; S. Tagawa ; T. Kai ; T. Shimokawa

Pub. info.:	Advances in resist materials and processing technology XXV. 2 pp.69232A-1-69232A-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923

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Author: T. Shimokawa