1.

Conference Proceedings
Conference Proceedings
1. Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool
T. Suzuki ; K. Kakizaki ; T. Matsunaga ; S. Tanaka ; Y. Kawasuji ; M. Shimbori ; M. Yoshino ; T. Kumazaki ; H. Umeda ; H. Nagano ; S. Nagai ; Y. Sasaki ; H. Mizoguchi
Pub. info.: Optical microlithography XX.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6520
2.

Conference Proceedings
Conference Proceedings
2. Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography
T. Kumazaki ; T. Suzuki ; S. Tanaka ; R. Nohdomi ; M. Yoshino
Pub. info.: Optical Microlithography XXI.  2  pp.69242R-1-69242R-10,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6924