1.

Conference Proceedings
Conference Proceedings
1. Particle Removal from Si Substrates in Organic Solvents using Megasonic Energy
F. Barbagini ; T. Janssens ; T. Bearda ; S. Armini ; J. Van Hoeymissen
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.101-108,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
2.

Conference Proceedings
Conference Proceedings
2. Local Removal Frequency of Nano Particles in Megasonic Cleaning
T. Janssens ; K.L. Wostyn ; S. Arnauts ; A. De Geyter ; T. Bearda
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.353-360,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
3.

Conference Proceedings
Conference Proceedings
3. Post Ion-Implant Photoresist Removal via Wet Chemical Cleans Combined with Physical Force Pretreatments
G.G. Totir ; M. Frank ; R. Vos ; S. Arnauts ; T. Bearda
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.219-226,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
4.

Conference Proceedings
Conference Proceedings
4. Damage Clustering and Damage-Size Distributions After Megasonic Cleaning
C. De Marco ; K.L. Wostyn ; T. Bearda ; K. Sano ; K. Kenis
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.87-93,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
5.

Conference Proceedings
Conference Proceedings
5. Particle Removal from Micrometer-Sized Trenches Using High-Velocity-Aerosol Cleaning and Comparison with Megasonic Tank Cleaning
K.L. Wostyn ; K. Sano ; A. Eitoku ; T. Janssens ; T. Bearda
Pub. info.: Cleaning and surface conditioning technology in semiconductor device manufacturing 10.  pp.55-60,  2007.  Pennington, N.J..  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 11(2)
6.

Conference Proceedings
Conference Proceedings
6. MANAGEMENT OF METALLIC CONTAMINATION IN ADVANCED IC MANUFACTURING
A. Danel ; D. Renaud ; P. Besson ; C. Bigot ; A. Groujilet ; J. P. Joly ; M. Claes ; T. Bearda ; J. Frickinger
Pub. info.: Cleaning Technology in Semiconductor Device Manufacturing IX.  pp.3-10,  2006.  Pennington, NJ.  Electrochemical Society
Title of ser.: ECS transactions
Ser. no.: 1(3)