1.

Conference Proceedings
Conference Proceedings
1. DEVELOPMENT OF COKE DEPOSITION RETARDING BIMETALLIC TUBES FOR ETHYLENE CRACKING FURNACES
Suzuki, G. ; Uchida, M. ; Ohsaki, K. ; Onodera, T. ; Umemura, T. ; Sundaram, K. M.
Pub. info.: AIChE SPRING NATIONAL MEETING, NEW ORLEANS, LA. -APRIL 6-10,1986.  1986.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1986
2.

Conference Proceedings
Conference Proceedings
2. Process Plant CIM Considering Plant Life Cycle Model-Integration of Design and Operation Phases using a Comprehensive Data Base
Kaneko, T. ; Suzuki, G. ; Honda, T. ; Nishi, Y.
Pub. info.: AIChE 1993 ANNUAL MEETING - ST. LOUIS, MO - NOV. 7-12, 1993.  1993.  New York.  American Institute of Chemical Engineers
Title of ser.: AIChE meeting [papers]
Ser. no.: 1993
3.

Conference Proceedings
Conference Proceedings
3. LEEPL mask fabrication using SOI substrates
Yotsui, K. ; Suzuki, G. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.942-950,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Litho-and-mask concurrent approach to the critical issues for proximity electron lithography
Omori, S. ; Iwase, K. ; Amai, K. ; Watanabe, Y. ; Nohama, S. ; Nohdo, S. ; Moriya, S. ; Kitagawa, T. ; Yotsui, K. ; Suzuki, G. ; Tamura, A.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.132-142,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
5.

Conference Proceedings
Conference Proceedings
5. A novel approach to the mask inspection for proximity electron lithography based on electron beam imaging
Iwase, K. ; Omori, S. ; Nohama, S. ; Yotsui, K. ; Suzuki, G. ; Sasaki, Y. ; Itoh, K. ; Tamura, A. ; Maruyama, S. ; Moriya, S. ; Kitagawa, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.915-922,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446