1.

Conference Proceedings
Conference Proceedings
1. Yield-limiting NMOSFET gate depletion in a deep submicrometer CMOS process
Karnett,M.P. ; Qian,S. ; Mitchell,T. ; Subramaniam,V. ; Sur,H. ; Haby,B.J. ; Brugge,H.B.
Pub. info.: Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA.  pp.191-199,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4181
2.

Conference Proceedings
Conference Proceedings
2. Optimized shallow trench isolation for sub-0.18-ｦﾌm ASIC technologies
Nouri,F. ; Laparra,O. ; Sur,H. ; Saha,S. ; Pramanik,D. ; Manley,M.
Pub. info.: Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California.  pp.156-166,  1998.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3506
3.

Conference Proceedings
Conference Proceedings
3. Influence of metal deposition temperature on deep-submicrometer metal lithography
Subramaniam,V. ; Siems,D.D. ; Karnett,M.P. ; Maheshwary,S.R. ; Sur,H.
Pub. info.: In-Line Methods and Monitors for Process and Yield Improvement.  pp.298-305,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3884