1.

Conference Proceedings
Conference Proceedings
1. Aqueous Slurries in Chemical Mechanical Polishing: Adsorption of Silicate Ions by Ceria
Osseo-Asare, K. ; Suphantharida, P.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.222-228,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-26
2.

Conference Proceedings
Conference Proceedings
2. Cerium Oxide Slurries in Chemical Mechanical Polishing: Silica/Ceria Interactions
Suphantharida, P. ; Osaco-Asare, K.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.257-265,  2002.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2002-1