1.

Conference Proceedings
Conference Proceedings
1. Practical LEEPL masks for sub-65-nm node
Yotsui, K. ; Sumida, T. ; Negishi, Y. ; Yoshii, T. ; Tamura, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.1268-1277,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567
2.

Conference Proceedings
Conference Proceedings
2. Image placement of large window-size membrane for EPL and LEEPL mask [5853-80]
Eguchi, H. ; Sumida, T. ; Susa, T. ; Negishi, Y. ; Kurosu, T. ; Yoshii, T. ; Yamazaki, T. ; Yotsui, K. ; Sugimura, H. ; Tamura, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.910-920,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
3.

Conference Proceedings
Conference Proceedings
3. Global image placement of LEEPL mask
Eguchi, H. ; Susa, T. ; Sumida, T. ; Kurosu, T. ; Yoshii, T. ; Yotsui, K. ; Sugimura, H. ; Itoh, K. ; Tamura, A.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.935-942,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567