1.

Conference Proceedings
Conference Proceedings
1. Improving overly manufacturing metrics through application of feedforward mask-bias
Joubert, E. ; Pellegrini, J.C. ; Misra, M. ; Sturtevant, J.L. ; Bernhard, J.M. ; Ong, P. ; Crawshaw, N.K. ; Puchalski, V.
Pub. info.: Advanced process control and automation : 27 February, 2003, Santa Clara, California, USA.  pp.63-74,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5044
2.

Conference Proceedings
Conference Proceedings
2. Resist compacting under SEM E-Beam
Gu, Y. ; Chou, D. ; Sturtevant, J.L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.823-831,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Single wafer process to generate reliable swing
Gu, Y. ; Zhu, C. ; Sturtevant, J.L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.832-840,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
4.

Conference Proceedings
Conference Proceedings
4. Contact-hole MEEF comparison between ALTA and 50-KeV written masks
Sturtevant, J.L. ; Opitz, J. ; Word, J.C.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1055-1061,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Characterization and reduction of highly localized substrate contamination defects in metal patterning
Gu, Y. ; Zhang, A. ; Yu, Z. ; Cao, W. ; Chen, S. ; Sturtevant, J.L. ; Lee, S.K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part Two  pp.636-645,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
6.

Conference Proceedings
Conference Proceedings
6. Assist feature OPC implementation for the 130-nm technology node with KrF and no forbidden pitches
Word, J.C. ; Zhu, S. ; Sturtevant, J.L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1139-1147,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Reduction of reflective notching through illumination optimization
Word, J.C. ; Chou, D. ; Gu, Y. ; Sturtevant, J.L.
Pub. info.: Optical Microlithography XV.  Part Two  pp.990-998,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
8.

Conference Proceedings
Conference Proceedings
8. Reduction of implantation shadowing effect by dual-wavelength exposure photo process
Gu, Y. ; Chou, D. ; Lee, S.Y. ; Roche, W.R. ; Sturtevant, J.L.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1312-1318,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039