1.

Conference Proceedings
Conference Proceedings
1. Measures to achieve 20-nm IPL stenecil mask distortion
Hougeneder, E. ; Chalupka A. ; Lammer, T. ; Loeschner, H. ; Kamm, F.-M. ; Struck, T. ; Ehrmann, A. ; Kaesmaier, R. ; Wolter, A. ; Butschke, J. ; Irmscher, M. ; Letzkus, F. ; Springer, R.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.23-31,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
2.

Conference Proceedings
Conference Proceedings
2. Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec (M5k) DUV tool
Scheuring, G. ; Petrashenko, A. ; Doebereiner, S. ; Hillmann, F. ; Brucek, H.-J. ; Hourd, A.C. ; Grimshaw, A. ; Hughes, G. ; Chen, S.-B. ; Chen, P.W. ; Schaetz, T. ; Struck, T. ; Van Adrichem, P.J.M. ; Boerland, H. ; Lehnigk, S.
Pub. info.: 19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.138-147,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5148