1.

Conference Proceedings
Conference Proceedings
1. Printability study with polarization based AIMS fab 193i to investigate mask polarization effects [6281-11]
Zibold, A. ; Stroessner, U. ; Poortinga, E. ; Schmid, R. ; Scherubl, T ; Rosenkranz, N. ; Harnisch, W.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.628108-628108,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. Printability study with polarisation capable AIMS fab 193i to study polarisation effects [6152-92]
Zibold, A. ; Stroessner, U. ; Ridley, A. ; Scherubl, T. ; Rosenkranz, N. ; Harnisch, W. ; Poortinga, E. ; Schmid, R. ; Bekaert, J. ; Philipsen, V. ; Van Look, L.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61522F-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152