1.

Conference Proceedings
Conference Proceedings
1. Chrome etch for <0.13μm advanced reticle production
Buie,M.J. ; Stoehr,B. ; Huang,Y.-C.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.633-640,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
2.

Conference Proceedings
Conference Proceedings
2. Extended chamber matching and repeatability study for chrome etch
Huang,Y.-C. ; Buie,M.J. ; Stoehr,B. ; Buxbaum,A. ; Ruhl,G.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.624-632,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
3.

Conference Proceedings
Conference Proceedings
3. Endpoint solution for photomask chrome loads down to 0.25%
Buie,M.J. ; Stoehr,B. ; Buxbaum,A. ; Ruhl,G.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.616-623,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
4.

Conference Proceedings
Conference Proceedings
4. Characterization of an integrated multibeam laser mask-pattern generation and dry etch processing total solution
Buxbaum,A. ; Buie,M.J. ; Stoehr,B. ; Montgomery,W. ; Fuller,S.E.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.338-352,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562