1.

Conference Proceedings
Conference Proceedings
1. Evaluation of the capability of a multibeam confocal inspection system for inspection of EUVL mask blanks
Stivers, A.R. ; Liang, T. ; Penn, M.J. ; Lieberman, B. ; Shelden, G.V. ; Folta, J.A. ; Larson, C.C. ; Mirkarimi, P.B. ; Walton, C.C. ; Gulliksong, E.M. ; Yi, M.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.408-417,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
2.

Conference Proceedings
Conference Proceedings
2. Pattern inspection of EUV masks using DUV light
Liang, T. ; Tejnil, E. ; Stivers, A.R.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1065-1072,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Inspection of EUV reticles
Pettibone, D.W. ; Veldman, A. ; Liang, T. ; Stivers, A.R. ; Mangat, P.J. ; Lu, B. ; Hector, S.D. ; Wasson, J.R. ; Bleadel, K.L. ; Fisch, E. ; Walker, D.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.363-374,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
4.

Conference Proceedings
Conference Proceedings
4. Damage-free mask repair using electron-beam-induced chemical reactions
Liang, T. ; Stivers, A.R.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.375-384,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
5.

Conference Proceedings
Conference Proceedings
5. EUV substrate and blank inspection with confocal microscopy
Urbach, J.-P. ; Cavelaars, J.F.W. ; Kusunose, H. ; Liang, T. ; Stivers, A.R.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.556-565,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems
Chandhok, M. ; Lee, S.H. ; Krautschik, C.G. ; Zhang, G. ; Rice, B.J. ; Goldstein, M. ; Panning, E. ; Bristol, R. ; Stivers, A.R. ; Shell, M.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.854-860,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
7.

Conference Proceedings
Conference Proceedings
7. EUVL defect printability at the 32-nm node
Gullikson, E.M. ; Tejnil, E. ; Liang, T. ; Stivers, A.R.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.791-796,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
8.

Conference Proceedings
Conference Proceedings
8. Demonstration of damage-free mask repair using electron beam-induced processes
Liang, T. ; Stivers, A.R. ; Penn, M. ; Bald, D. ; Sethi, C. ; Boegli, V. ; Budach, M. ; Edinger, K. ; Spies, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.291-300,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446