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27 results

Conference Proceedings

1. Reliable materials and instruments for 157-nm lithography (Abstract Only)

Vogler,K. ; Voss,F. ; Bergmann,E. ; Stamm,U. ; Walecki,W.J. ; Basting,D.

Pub. info.:	Laser-induced damage in optical materials, 2000 : 32nd Annual Boulder Damage Symposium, proceedings, 16-18, October, 2000, Boulder, Colorado. pp.445-446, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4347

Conference Proceedings

2. Development and characterization of advanced F2 laser source for 157-nm lithography (Abstract Only)

Vogler,K. ; Voss,F. ; Bergmann,E. ; Stamm,U. ; Govorkov,S.V. ; Hua,G. ; Walecki,W.J.

Pub. info.:	Laser-induced damage in optical materials, 2000 : 32nd Annual Boulder Damage Symposium, proceedings, 16-18, October, 2000, Boulder, Colorado. pp.444-444, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4347

Conference Proceedings

3. High-power ultraviolet all-solid-state laser for industrial applications

Mehlmann,C. ; Schroder,T. ; Klopp,P. ; Koch,R. ; Stamm,U. ; Basting,D.

Pub. info.:	Laser applications in microelectronic and optoelectronic manufacturing IV : 25-27 January 1999, San Jose, California. pp.396-402, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3618

Conference Proceedings

4. ArF excimer laser for 193-nm lithography

Stamm,U. ; Patzel,R. ; Kleinschmidt,J. ; Vogler,K. ; Zschocke,W. ; Bragin,I. ; Basting,D.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.1010-1013, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

5. High-repetition-rate excimer lasers for DUV Lithography

Stamm,U. ; Paetzel,R. ; Bragin,I. ; Berger,V. ; Klaft,I. ; Kleinschmidt,J. ; Osmanov,R. ; Schroeder,T. ; Vogler,K. ; Zschocke,W. ; Basting,D.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part2 pp.1050-1057, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

6. Excimer laser for 157-nm lithography

Stamm,U. ; Bragin,I. ; Govorkov,S.V. ; Kleinschmidt,J. ; Patzel,R. ; Slobodtchikov,E. ; Vogler,K. ; F.Voｦﾂ ; Basting,D.

Pub. info.:	Emerging lithographic technologies III : 15-17 March 1999, Santa Clara, California. Part2 pp.816-826, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3676

Conference Proceedings

7. 1-J and 300-W excimer laser with exceptional pulse stability for poly-Si crystallization

Fiebig,M. ; Stamm,U. ; Oesterlin,P. ; Kobayashi,N. ; Fechner,B.

Pub. info.:	Flat panel display technology and display metrology II : 22-23 January 2001, San Jose, [California] USA. pp.38-40, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4295

Conference Proceedings

8. Long-term test and characterization of optical components at 193 nm and 157 nm

Vogler,K. ; Klaft,I. ; Schroder,T. ; Stamm,U. ; Mann,K.R. ; Apel,O. ; Gorling,C. ; Leinhos,U.

Pub. info.:	Inorganic optical materials II : 1-3 August, 2000, San Diego, USA. pp.255-260, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4102

Conference Proceedings

9. Prospects for very high repetition rate lasers for microlithography

Bragin,I. ; Berger,V. ; Patzel,R. ; Stamm,U. ; Targsdorf,A. ; Kleinschmidt,J. ; Basting,D.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1445-1451, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

10.

Conference Proceedings

10. High-repetition-rate ultranarrow-bandwidth 193-nm excimer lasers for DUV lithography

Stamm,U. ; Patzel,R. ; Bragin,I. ; Kleinschmidt,J. ; Lokai,P. ; Osmanov,R. ; Schrbder,T. ; Sprenger,M. ; Zschocke,W.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1390-1396, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

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