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Conference Proceedings

1. Imprint lithography: lab curiosity or the real NGL (Keynote Address)

Resnick, D.J. ; Dauksher, W.J. ; Mancini, D.P. ; Nordquist, K.J. ; Bailey, T.C. ; Johnson, S.C. ; Stacey, N.A. ; Ekerdt, J.G. ; Willson, C.G. ; Sreenivasan, S.V. ; Schumaker, N.E.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.12-23, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

2. Design and performance of a step and repeat imprinting machine

McMackin, I. ; Schumaker, P. ; Babbs, D. ; Choi, J. ; Collison, W. ; Sreenivasan, S.V. ; Schumaker, N.E. ; Watts, M.P.C. ; Voisin, R.D.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.178-186, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

3. Cost of ownership analysis for patterning using step and flash imprint lithography

Sreenivasan, S.V. ; Willson, C.G. ; Schumaker, N.E. ; Resnick, D.J.

Pub. info.:	Emerging Lithographic Technologies VI. Part Two pp.903-909, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

4. High-resolution templates for step and flash imprint lithography

Resnick, D.J. ; Dauksher, W.J. ; Mancini, D.P. ; Nordquist, K.J. ; Ainley, E.S. ; Gehoski, K.A. ; Baker, J.H. ; Bailey, T.C. ; Choi, B.J. ; Johnson, S. ; Sreenivasan, S.V. ; Ekerdt, J.G. ; Willson, C.G.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.205-213, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

5. Step and Repeat UV nanoimprint lithography tools and processes

McMackin, I. ; Choi, J. ; Schumaker, P. ; Nguyen, V. ; Xu, F. ; Thompson, E. ; Babbs, D. ; Sreenivasan, S.V. ; Watts, M. ; Schumaker, N.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.222-231, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

6. Development of imprint materials for the Step and Flash Imprint Lithography process

Xu, F. ; Stacey, N.A. ; Watts, M. ; Truskett, V. ; McMackin, I. ; Choi, J. ; Schumaker, P. ; Thompson, E. ; Babbs, D. ; Sreenivasan, S.V. ; Willson, C.G. ; Schumaker, N.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.232-241, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

7. New methods for fabricating step and flash imprint lithography templates

Resnick, D.J. ; Bailey, T.C. ; Mancini, D.P. ; Nordquist, K.J. ; Dauksher, W.J. ; Ainley, E.S. ; Talin, A. ; Gehoski, K.A. ; Baker, J.H. ; Choi, B.J. ; Johnson, S. ; Colburn, M. ; Meissl, M.J. ; Sreenivasan, S.V. ; Ekerdt, J.G. ; Willson, C.G.

Pub. info.:	Nanostructure Science, Metrology, and Technology. pp.176-181, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4608

Conference Proceedings

8. Low-cost nanostructure patterning using step and flash imprint lithography

Sreenivasan, S.V. ; Willson, C.G. ; Schumaker, N.E. ; Resnick, D.J.

Pub. info.:	Nanostructure Science, Metrology, and Technology. pp.187-194, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4608

Conference Proceedings

9. Employing Step-and-Flash imprint lithography for gate-level patterning of a MOSFET device

Smith, B.J. ; Stacey, N.A. ; Donnelly, J.P. ; Onsongo, D.M. ; Bailey, T.C. ; Mackay, C.J. ; Resnick, D.J. ; Dauksher, W.J. ; Mancini, D.P. ; Nordquist, K.J. ; Sreenivasan, S.V. ; Banerjee, S.K. ; Ekerdt, J.G. ; Willson, G.C.

Pub. info.:	Emerging Lithographic Technologies VII. 2 pp.1029-1034, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

10.

Conference Proceedings

10. Fabrication of Step and Flash imprint lithography templates using commercial mask processes

Thompson, E. ; Rhyins, P.D. ; Voisin, R.D. ; Sreenivasan, S.V. ; Martin, P.M.

Pub. info.:	Emerging Lithographic Technologies VII. 2 pp.1019-1028, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

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