1.

Conference Proceedings
Conference Proceedings
1. Optimization of LPCVD Nitride Deposition Conditions for Non-Volatile Memory Inter Poly Dielectric Applications
Teeperi, M.J. ; van Wiek, M.A.A.M. ; Sprey, H.
Pub. info.: CVD XV, proceedings of the fifteenth International Symposium on Chemical Vapor Deposition.  pp.629-636,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-13
2.

Conference Proceedings
Conference Proceedings
2. Chlorine Precursors for Gate Oxidation Processes
McGeary, M. J. ; Martens, P. W. ; Vermeire, B. ; Heyns, M. ; Sprey, H. ; Lubbers, A. ; Schaekers, M.
Pub. info.: Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A..  pp.115-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 447
3.

Conference Proceedings
Conference Proceedings
3. Effect of Cl in Gate Oxidation
Mertens, P. W. ; McGeary, M. J. ; Schaekers, M. ; Sprey, H. ; Vermeire, B. ; Depas, M. ; Meuris, M. ; Heyns, M. M.
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.89-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477
4.

Conference Proceedings
Conference Proceedings
4. Critical Processes for Ultrathin Gate Oxide Integrity
Depas, M. ; Heyns, M.M. ; Nigam, T. ; Kenis, K. ; Sprey, H. ; Wilhelm, R. ; Crossley, A. ; Sofield, C.J. ; Graef, D.
Pub. info.: The physics and chemistry of SiO[2] and the Si-SiO[2] interface-3, 1996 : proceedings of the Third International Symposium on the Physics and Chemistry of SiO[2] and the Si-SiO[2] Interface.  pp.352-366,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-1
5.

Conference Proceedings
Conference Proceedings
5. Effect of Cl in Gate Oxidation
Mertens, P. W. ; McGeary, M. J. ; Schaekers, M. ; Sprey, H. ; Vermeire, B. ; Depas, M. ; Meuris, M. ; Heyns, M. M.
Pub. info.: Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A..  pp.149-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 473