1.

Conference Proceedings
Conference Proceedings
1. *THE STATISTICS OF IN-SITU PARTICLE MONITORS
Spanos, C.J. ; Cunningham, S.P. ; Smith, L.
Pub. info.: Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III.  pp.117-130,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-9
2.

Conference Proceedings
Conference Proceedings
2. A Multistep Supervisory Controller for Photolithographic Operations
Spanos, C.J. ; Leang, S. ; Ma, S-Y. ; Thomson, J. ; Bombay, B. ; Niu, X.
Pub. info.: Proceedings of the Symposium on Process control, Diagnostics, and Modeling in Semiconductor Manufacturing.  pp.3-17,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-2
3.

Conference Proceedings
Conference Proceedings
3. Optimum sampling for characterization of systematic variation in photolithography
Cain, J.P. ; Zhang, H. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.430-442,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
4.

Conference Proceedings
Conference Proceedings
4. Characterizing post-exposure bake processing for transient- and stedy-state conditions in the context of critical dimension control
Steele, D.A. ; Coniglio, A. ; Tang, C. ; Singh, B. ; Nip, S. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.517-530,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
5.

Conference Proceedings
Conference Proceedings
5. Compact formulation of mask error factor for critical dimension control in optical lithography
Zhang, H. ; Cain, J.P. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.462-465,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689
6.

Conference Proceedings
Conference Proceedings
6. Across-wafer CD uniformity enhancement through control of multizone PEB profiles
Zhang, Q. ; Friedberg, P.D. ; Tang, C. ; Singh, B. ; Poolla, K. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.276-286,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
7.

Conference Proceedings
Conference Proceedings
7. Time-based PEB adjustment for optimizing CD distributions
Friedberg, P.D. ; Tang, C. ; Singh, B. ; Brueckner, T. ; Gruendke, W. ; Schulz, B. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.703-712,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
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Conference Proceedings
Conference Proceedings
8. Electrical linewidth metrology for systematic CD variation characterization and causal analysis
Cain, J.P. ; Spanos, C.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.350-361,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038