1.

Conference Proceedings
Conference Proceedings
1. 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers
Sooriyakumaran,R. ; Fenzel-Alexander,D. ; Brock,P.J. ; Larson,C.E. ; DiPietro,R.A. ; Wallraff,G.M. ; Hofer,D.C. ; Dawson,D.J. ; Mahorowala,A.P. ; Angelopoulos,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.1171-1180,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Reactive ion etching of 193-nm resist candidates: current platforms and future requirements
Wallow,T.I. ; Brock,P.J. ; DiPietro,R.A. ; Allen,R.D. ; Opitz,J. ; Sooriyakumaran,R. ; Hofer,D.C. ; Meute,J. ; Byers,J.D. ; Rich,G.K. ; McCallum,M. ; Schuetze,S. ; Jayaraman,S. ; Hullihen,K. ; Vicari,R. ; Rhodes,L.F. ; Goodall,B.L. ; Shick,R.A.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.92-101,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Photoresists using tetrahydropyranyl- and tetrahydrofuranyl-protected styrene maleic anhydride half-ester polymers
Huang,W.-S. ; Sooriyakumaran,R. ; Kwong,R.W. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.776-785,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Protecting groups for 193-nm photoresists
Allen,R.D. ; Sooriyakumaran,R. ; Opitz,J. ; Wallraff,G.M. ; DiPietro,R.A. ; Breyta,G. ; Hofer,D.C. ; Kunz,R.R. ; Jayaraman,S. ; Shick,R. ; Goodall,B. ; Okoroanyanwu,U. ; Wilson,C.G.
Pub. info.: Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California.  pp.334-343,  1996.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2724
6.

Conference Proceedings
Conference Proceedings
6. Toward controlled resist line-edge roughness:material origin of line-edge roughness in chemically amplified positive-tone resists
Lin,Q. ; Sooriyakumaran,R. ; Huang,W.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.230-239,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
7.

Conference Proceedings
Conference Proceedings
7. New approaches to production-worthy 193-nm photoresists based on acrylic copolymers
Wallow,T.I. ; Allen,R.D. ; Opitz,J. ; Dipietro,R.A. ; Brock,P.J. ; Sooriyakumaran,R. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.579-586,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
8.

Conference Proceedings
Conference Proceedings
8. Silicon-containing resists for 157-nm applications
Sooriyakumaran,R. ; Fenzel-Alexander,D. ; Fender,N. ; Wallraff,G.M. ; Allen,R.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.319-326,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
9.

Conference Proceedings
Conference Proceedings
9. "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization"
Kwong,R.W. ; Varanasi,P.R. ; Lawson,M.C. ; Hughes,T. ; Jordhamo,G.M. ; Khojasteh,M. ; Mahorowala,A.P. ; Sooriyakumaran,R. ; Brock,P.J. ; Larson,C.E. ; Fenzel-Alexander,D. ; Truong,H.D. ; Allen,R.D.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.50-57,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345