1.

Conference Proceedings
Conference Proceedings
1. Approaches to etch-resistant 193-nm photoresists: performance and prospects
Allen, R. D. ; Opitz, J. ; Ito, H. ; Wallow, T. I. ; Casmier, D. V. ; DiPietro, R. A. ; Brock, P. J. ; Breyta, G. ; Sooriyakumaran, R. ; Larson, C. E. ; Hofer, D. C. ; Varanasi, P. R. ; Mewherter, A. M. ; Jayaraman, S. ; Vicari, R. ; Rhodes, L. F. ; Sun, S.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.66-77,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, T. I. ; Brock, P. J. ; DiPietro, R. A. ; Allen, R. D. ; Opitz, J. ; Sooriyakumaran, R. ; Hofer, D. C. ; Mewherter, A. M. ; Cui, Y. ; Yan, W. ; Worth, G. ; Moreau, W. M. ; Meute, J. ; Byers, J. D. ; Rich, G. K. ; McCallum, M. ; Jayaraman, S. ; Vicari, R. ; Cagle, J. ; Sun, S. ; Hullihen, K. A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.26-35,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists
Ito, Hiroshi ; Breyta, Greg ; Hofer, Donald C. ; Sooriyakumaran, R.
Pub. info.: Microelectronics technology : polymers in advanced imaging and packaging : developed from a symposium sponsored by the ACS Division of Polymeric Materials: Science and Engineering, Inc., and the Polymers for Microelectronics Division of the Society of Polymer Science, Japan, at the 209th National Meeting of the American Chemical Society, Anaheim, California, April 2-6, 1995.  pp.21-,  1995.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 614
4.

Conference Proceedings
Conference Proceedings
4. High-resolution 248-nm bilayer resist
Lin, Q. ; Petrillo, K. E. ; Babich, K. ; Tulipe, D. C. La ; Medeiros, D. ; Mahorowala, A. ; Simons, J. P. ; Angelopoulos, M. ; Wallraff, G. M. ; Larson, C. E. ; Fenzel-Alexander, D. ; Sooriyakumaran, R. ; Breyta, G. ; Brock, P. J. ; DiPietro, R. A. ; Hofer, D. C.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.241-250,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
5.

Conference Proceedings
Conference Proceedings
5. Acid-Catalyzed Dehydration: A New Mechanism for Chemically Amplified Lithographic Imaging
Ito, H. ; Maekawa, Y. ; Sooriyakumaran, R. ; Mash, E. A.
Pub. info.: Polymers for microelectronics : resists and dielectrics.  pp.64-,  1994.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 537
6.

Conference Proceedings
Conference Proceedings
6. Soluble Polysilanes in Photolithography
Miller, R. D. ; Hofer, D. ; Rabolt, J. ; Sooriyakumaran, R. ; Willson, C. G. ; Fickes, G. N. ; Guillet, J. E. ; Moore, J.
Pub. info.: Polymers for high technology : electronics and photonics.  pp.170-,  1987.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 346
7.

Conference Proceedings
Conference Proceedings
7. Soluble Polysilane Derivatives: Chemistry and Spectroscopy
Miller, R. D. ; Rabolt, J. F. ; Sooriyakumaran, R. ; Fleming, W. ; Fickes, G. N. ; Farmer, B. L. ; Kuzmany, H.
Pub. info.: Inorganic and organometallic polymers : macromolecules containing silicon, phosphorus, and other inorganic elements.  pp.43-,  1988.  Washington, DC.  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 360
8.

Conference Proceedings
Conference Proceedings
8. 193-nm negative resist based on acid-catalyzed elimination of polar molecules
Sooriyakumaran, R. ; Davis, B.W. ; Larson, C.E. ; Brock, P.J. ; DiPietro, R.A. ; Wallow, T.I. ; Connor, E.F. ; Sundberg, L.K. ; Breyta, G. ; Allen, R.D. ; Patel, K.S. ; Varanasi, P.R.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.71-78,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
9.

Conference Proceedings
Conference Proceedings
9. Direct determination of photoresist composition changes during UV exposure [6153-36]
Houle, F. A. ; Deline, V. R. ; Truong, H. ; Sooriyakumaran, R.
Pub. info.: Advances in Resist Technology and Processing XXIII.  pp.61530Z-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6153
10.

Conference Proceedings
Conference Proceedings
10. Evolution of a 193-nm bilayer resist for manufacturing
Kwong, R.W. ; Khojasteh, M. ; Lawson, P. ; Hughes, T. ; Varanasi, P.R. ; Brunsvold, B. ; Allen, R.D. ; Brock, P.J. ; Sooriyakumaran, R. ; Truong, H.D. ; Mahorowala, A.P. ; Medeiros, D.R.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.403-409,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690