1.

Conference Proceedings
Conference Proceedings
1. Gate CD control for full chip using total-process-proximity-based correction method
Nam,B.H. ; Park,J.O. ; Lee,D.J. ; Cheong,J.H. ; Hwang,Y.J. ; Song,Y.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.716-724,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
2.

Conference Proceedings
Conference Proceedings
2. Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction
Nam,B.H. ; Kim,D.S. ; Cho,B.H. ; Seok,N.K. ; Jeong,J.K. ; Kim,S.P. ; Kang,S.W. ; Hwang,Y.J. ; Song,Y.J.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.793-800,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
3.

Conference Proceedings
Conference Proceedings
3. Wafer scale error induced by bottom antireflective coating
Kim,D.-S. ; Jeong,J.-H. ; Nam,B.-H. ; Hwang,Y.J. ; Song,Y.J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.608-615,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
4.

Conference Proceedings
Conference Proceedings
4. Lens aberration measurement and analysis using a novel pattern
Nam,B.H. ; Cho,B.H. ; Park,J.O. ; Kim,D.-S. ; Baek,S.J. ; Jeong,J.H. ; Nam,B.-S. ; Hwang,Y.J. ; Song,Y.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.1290-1299,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346