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Conference Proceedings

1. In-situ Rapid Thermal N20 Oxidation of NH3-Nitrided Si for Ultrathin Nitride/Oxide Stack Gate Formation

Kim, Y.H. ; Song, S.C. ; Luan, H.F. ; Gelpey, J.C. ; Kepton, A. ; Levy, S. ; Bloom, R. ; Kwong, D.-L.

Pub. info.:	Rapid thermal and other short-time processing technologies : proceedings of the international symposium. pp.239-246, 2000. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-9

Conference Proceedings

2. Recent Developments in Ultratlsin Nitride Gate Stack Prepared by In-Situ RTP Multiprocessing for CMOS ULSI

Song, S.C. ; Kini, B.Y. ; Loan, H.F. ; Kwong, D.-L. ; Gardner, M. ; Fulford, J. ; Wristers, D. ; Gelpey, J. ; Marcus, S.

Pub. info.:	Advances in rapid thermal processing : proceedings of the symposium. pp.45-56, 1999. Pennington, N. J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-10

Conference Proceedings

3. Comparison of MOSFET Characteristics Between ALD and MOCVD TiN Metal Gate on Hf Silicate

Song, S.C. ; Lee, B.H. ; Zhang, Z. ; Choi, K. ; Bae, S.H. ; Alshareef, H. ; Majhi, P. ; Wen, H.C. ; Bennett, J. ; Sassman, B. ; Zeitzoff, P.

Pub. info.:	ULSI Process Integration : proceedings of the International Symposium. pp.419-424, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-06

Conference Proceedings

4. Recent Development of CMOS Technology with Hf-Based High-k Dielectric

Song, S.C. ; Bersuker, G. ; Zhang, Z. ; Lee, B.H. ; Huffman, C. ; Bae, S.H. ; Sim, J.H. ; Kirsch, P. ; Majhi, P. ; Moumen, N, ; Ramiller, C.

Pub. info.:	Silicon nitride, silicon dioxide thin insulating films, and other emerging dieletrics VIII : proceedings of the international symposium. pp.456-470, 2005. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-01