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24 results

Conference Proceedings

1. Fast topography simulation using differential method

Zinn, S.Y. ; Kim, S.-H. ; Choi, S.-W. ; Sohn, J.-M.

Pub. info.:	Optical Microlithography XVI. Part One pp.92-100, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

2. Improvement of shot uniformity on a wafer by controlling backside transmittance distribution of a photomask

Park, J.R. ; Kim, S.H. ; Yeo, G.-S. ; Choi, S.-W. ; Ki, W.-T. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	Optical Microlithography XVI. Part One pp.553-560, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

3. Feasibility evaluations of alternating phase-shift mask for imaging sub-80nm feature with KrF

Kang, M.-A. ; Kim, S.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1115-1124, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Phase defect printability analysis for chromeless phase lithography technology

Huh, S. ; Park, J.H. ; Chung, D.-H. ; Kim, C.-H. ; Shin, I.-K. ; Choi, S.-W. ; Sohn, J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.787-795, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Cho, S.-Y. ; Ahn, W.-S. ; Cho, W.-I. ; Sung, M.-G. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.107-117, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Develpment of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM

Jang, I.-Y. ; Lee, J.-Y. ; Kim, Y.-H. ; Choi, S.-W. ; Sohn, J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.246-252, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Study of characteristics and control of haze contamination induced by photochemical reaction

Han, S.-J. ; Yu, S.-Y. ; Sung, M.-G. ; Kim, Y.-H. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.563-567, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. Analytical approach to X-phenomenon in alternating phase-shifting masks

Park, J.R. ; Kim, S.-H. ; Lee, H.-J. ; Jang, I.-Y. ; Choi, Y.-H. ; Yang, S.-H. ; Lee, Y.-H. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1209-1216, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

9. PSM defect printability of extremely low-k1 sub-130-nm KrF lithography

Cho, W.-I. ; Yeo, G. ; Moon, S.-Y. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1202-1208, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

10.

Conference Proceedings

10. Fogging effect consideration in mask process at 50-KeV e-beam systems

Yang, S.-H. ; Choi, Y.-H. ; Park, J.-R. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Sohn, J.-M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.786-791, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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Author: Sohn, J.-M.