1.

Conference Proceedings
Conference Proceedings
1. The impact of illumination on feature fidelity for CPL mask technology
Kuijten, J. P. ; Verhappen, A. ; Conley, W. ; van de Goor, S. ; Litt, L. ; Wu, W. ; Lucas, K. ; Roman, B. ; Kasprowicz, B. ; Progler, C. ; Socha, R. ; van den Broeke, D. ; Wampler, K. ; Laidig, T. ; Hsu, S.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1557-1561,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. A single-exposure approach for petterning 45 nm flash/DRAM contacthole mask [6283-117]
Chen, T. ; Van Den Broeke, D. ; Tejnil, E. ; Hsu, S. ; Park, S. ; Berger, G. ; Coskun, T. ; De Vocht, J. ; Corcoran, N. ; Chen, F. J. ; van der Heijden, E. ; Finders, J. ; Engelen, A. ; Socha, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. A proposal for the contact hole assist feature printing checker in IML [5853-51]
Shieh, J. ; Socha, R. ; Shi, X. ; Chen, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.672-677,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology [5853-50]
Hsu, M. ; Van Den Broeke, D. ; Laidig, T. ; Wampler, K. E. ; Hollerbach, U. ; Socha, R. ; Chen, J. F. ; Hsu, S. ; Shi, X.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.659-671,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. Precision process calibration and CD predictions for low-k1 lithography [5853-64]
Chen, T. ; Park, S. ; Berger, G. ; Coskun, T. H. ; de Vocht, J. ; Chen, F. ; Yu, L. ; Hsu, S. ; van den Broeke, D. ; Socha, R. ; Park, J. ; Gronlund, K. ; Davis, T. ; Plachecki, V. ; Harris, T. ; Hansen, S. ; Lambson, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.785-799,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. ArF solutions for low-k1 back-end imaging
Wiaux, V. ; Montgomery, P.K. ; Vandenberghe, G. ; Monnoyer, P. ; Ronse, K.G. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Finders, J. ; Socha, R. ; Broeke, D.J.V.D.
Pub. info.: Optical Microlithography XVI.  Part One  pp.270-281,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
7.

Conference Proceedings
Conference Proceedings
7. Patterning optimization for 55nm design rule DRAM/flash memory using production-ready customized illuminations [5992-110]
Chen, T. ; Van Den Broeke, D. ; Hsu, S. ; Park, S. ; Berger, G. ; Coskun, T. ; de Vocht, J. ; Chen, F. ; Socha, R. ; Park, J. ; Gronlund, K.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599239-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
8.

Conference Proceedings
Conference Proceedings
8. Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
Van Den Broeke, D.J. ; Socha, R. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.297-308,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.
Pub. info.: Photomask Technology 2006.  pp.634922-634922,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
10.

Conference Proceedings
Conference Proceedings
10. Automatic pitch decomposition for improved process window when printing dense features at keff<0.20 [6283-102]
Huckabay, J. ; Staud, W. ; Naber, R. ; Dusa, M. ; Flagello, D. ; Socha, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830T-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283