1.

Conference Proceedings
Conference Proceedings
1. "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform chemistries"
Kajita,T. ; Nishimura,Y. ; Yamamoto,M. ; Ishii,H. ; Soyano,A. ; Kataoka,A. ; Slezak,M. ; Shimizu,M. ; Varanasi,P.R. ; Jordhamo,G. ; Lawson,M.C. ; Chen,R. ; Brunsvold,W.R. ; Li,W. ; Allen,R.D. ; Ito,H. ; Truong,H.D. ; Wallow,T.I.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.712-724,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
2.

Conference Proceedings
Conference Proceedings
2. 193-nm contact photoresist reflow feasibility study
Lucas,K.D. ; Slezak,M. ; Ercken,M. ; Roey,F.Van
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.725-736,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345