1.

Conference Proceedings
Conference Proceedings
1. Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing
Mahorowala,A.P. ; Babich,K. ; Petrillo,K.E. ; Simons,J.P. ; Angelopoulos,M. ; Patel,V. ; Grill,A. ; Halle,S. ; Conti,R. ; Wu,C.-H.J. ; Wise,R. ; Chen,L. ; Thomas,A.C. ; Lee,B. ; Mahorowala,A.P.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.306-316,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Extension of 248-nm optical lithography: a thin film imaging approach
Lin,Q. ; Katnani,A.D. ; Brunner,T.A. ; DeWan,C. ; Fairchok,C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Seeger,D.E. ; Angelopoulos,M. ; Soonyakumaran,R. ; Wallraff,G.M. ; Hofer,D.C.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.278-288,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Positive bilayer resists for 248-and 193-nm lithography
Sooriyakumaran,R. ; Wallraff,G.M. ; Larson,C.E. ; Fenzel-Alexander,D. ; DiPietro,R.A. ; Opitz,J. ; Hofer,D.C. ; LaTulipe,D.C.,Jr. ; Simons,J.P. ; Petrillo,K.E. ; Babich,K. ; Angelopoulos,M. ; Lin,Q. ; Katnani,A.D.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.219-227,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Effects of underlayer on performance of bilayer resists for 248-nm lithography
Babich,K. ; Callegari,A. ; Petrillo,K.E. ; Simons,J.P. ; LaTulipe,D.C.,Jr. ; Angelopoulos,M. ; Lin,Q.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.726-734,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Image collapse issues in photoresist
Simons,J.P. ; Goldfarb,D.L. ; Angelopoulos,M. ; Messick,S. ; Moreau,W.M. ; Robinson,C. ; Pablo,J.J.de ; Nealey,P.F.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.19-29,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345