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16 results

Conference Proceedings

1. Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.

Hwang, Y.-S. ; Jung, J.-C. ; Park, K.-D. ; Lee, S.-K. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S. ; Ding, S.-J. ; Xiang, Z. ; Neisser, M.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.1119-1125, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

2. Contact hole resolution enhancement by post exposure amine treatment (CONPEAT) process

Koh, C.-W. ; Kim, J.-S. ; Choi, C.-I. ; Eom, T.-S. ; Kwon, W.-T. ; Jung, J.-C. ; Bok, C.-K. ; Shin, K.-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.793-798, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

3. Contact hole patterning performance of ArF resist for 0.10μm technology node

Kim, J.-S. ; Jung, J.-C. ; Kong, K.-K. ; Lee, G.-S. ; Lee, S.-K. ; Hwang, Y.-S. ; Shin, K.-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.577-585, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

4. 100-nm device fabrication using ArF resist

Lee, S.-K. ; Jung, J.-C. ; Hwang, Y.-S. ; Park, K.-D. ; Kim, J.-S. ; Kong, K.-K. ; Shin, K.-S.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.571-576, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

5. Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Lee, G. ; Kong, K.-K. ; Jung, J.-C. ; Shin, K.-S. ; Kang, J.-H. ; Kim, S.D. ; Choi, Y.-J. ; Choi, S.-J. ; Kim, D.-B. ; Kim, J.-H.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.136-140, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

6. New approach for 193-nm resist using modified cycloolefin resin

Park, J.H. ; Seo, D.C. ; Kim, C.-M. ; Lim, Y.-T. ; Cho, S.-D. ; Lee, J.B. ; Joo,H.-S. ; Jeon, H.-P. ; Kim, S.-J. ; Jung, J.-C. ; Shin, K.-S. ; Kong, K.K. ; Yamada, T.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.120-126, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

7. 0.33-k1 ArF lithography for 100-nm DRAM

Bok, C.K. ; Kim, S.-K. ; Kim, H.-B. ; Oh, J.-S. ; Ahn, C.-N. ; Shin, K.-S.

Pub. info.:	Optical Microlithography XV. Part Two pp.810-821, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

8. Optical lithography simulation considering impact of mask errors

Kim, H.-B. ; Ma, W.-K. ; Ahn, C.-N. ; Shin, K.-S.

Pub. info.:	Optical Microlithography XV. Part Two pp.1278-1286, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

9. Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography

Kim, S.-K. ; Bok, C.-K. ; Shin, K.-S.

Pub. info.:	Optical Microlithography XV. Part Two pp.1504-1512, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

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Conference Proceedings

10. Intrafield CD variation by stray light from neighboring field

Lim, C.-M. ; Song, J.-H. ; Woo, S.-S. ; Kwon, K.-S. ; Ahn, C.-N. ; Shin, K.-S.

Pub. info.:	Optical Microlithography XV. Part Two pp.1412-1420, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

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Author: Shin, K.-S.