1.

Conference Proceedings
Conference Proceedings
1. Pattern-dependence optical phase effect on alternating phase shift mask
Chang, B.-C. ; You, J.-W. ; Lu, M. ; Lee, C.-L. ; Kung, L.-W. ; Shu, K.-C. ; Shin, J.-J. ; Gau, T.-S. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.745-755,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Alt- PSM of contact with phase-assist feature for 65-nm node
You, J.-W. ; Shin, J.-J. ; Chang, C.-H. ; Kung, L.-W. ; Chang, B.-C. ; Dai, C.-M. ; Gau, T.-S. ; Lin, B.J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1263-1272,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
3.

Conference Proceedings
Conference Proceedings
3. Model-based OPC for 0.13-μm contacts using 248-nm Att PSM
Shin, J.-J. ; Wu, T.C. ; Chen, C.-K. ; Liu, R.-G. ; Ku, Y.C. ; Lin, B.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1296-1307,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. General scaling law of optical lithography optical theory
Chen, C.-K. ; Gau, T.-S. ; Chen, L.-J. ; Lee, C.-C. ; Shin, J.-J. ; Yen, A. ; Lin, B.-J.
Pub. info.: Optical Microlithography XVII.  pp.1487-1498,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
5.

Conference Proceedings
Conference Proceedings
5. Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond
Chou, S.-Y. ; Shin, J.-J. ; Shu, K.-C. ; You, J.-W. ; Shiu, L.-H. ; Chang, B.-C. ; Gau, T.-S. ; Lin, B.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.508-515,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. Mask error tensor and causality of mask error enhancement for low-k1 imaging: theory and experiments
Chen, C.-K. ; Gau, T.-S. ; Shin, J.-J. ; Liu, R.-G. ; Yu. S.-S. ; Yen, A. ; Lin, B.J.
Pub. info.: Optical Microlithography XV.  Part One  pp.247-258,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691