1.

Conference Proceedings
Conference Proceedings
1. Materials screening for attenuating embedded phase-shift photoblanks for DUV and 193-nm photolithography
Carcia,P.F. ; French,R.H. ; Sharp,K.G. ; Meth,J.S. ; Smith,B.W.
Pub. info.: 16th Annual BACUS Symposium on Photomask Technology and Management.  pp.255-263,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2884
2.

Conference Proceedings
Conference Proceedings
2. Materials design and development of fluoropolymers for use as pellicles in 157-nm photolithography
French,R.H. ; Gordon,J.S. ; Jones,D.J. ; Lemon,M.F. ; Wheland,R.C. ; Zhang,E. ; Zumsteg Jr.,F.C. ; Sharp,K.G. ; Qiu,W.
Pub. info.: Optical Microlithography XIV.  4346  pp.89-97,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346