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16 results

Conference Proceedings

1. Dual Spectral Source Rapid Isothermal Processing Assisted CVD as a Unique Activation and Limited Reaction Processing CVD Technique

Singh, R. ; Sharangpani, R. ; Chen, Y.

Pub. info.:	Proceedings of the Thirteenth International Symposium on Chemical Vapor Deposition. pp.213-218, 1996. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	96-5

Conference Proceedings

2. Kinetic Study of In-Situ Copper Oxidation and Reduction Using Rapid Thermal Processing and Its Applications in ULSI

Hu, Y.Z. ; Sharangpani, R. ; Tay, S.-P.

Pub. info.:	Rapid thermal and other short-time processing technologies : proceedings of the international symposium. pp.329-336, 2000. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-9

Conference Proceedings

3. Characterization of Oxynitride Dielectric Films Grown in NO/O2 Mixtures by Rapid Thermal Oxynitridation

Everist, S.C. ; Meisenheimer, T.L. ; Nelson, G.C. ; Smith, P.M. ; Sharangpani, R. ; Tay, S.-P.

Pub. info.:	The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000. pp.131-144, 2000. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-2

Conference Proceedings

4. High Energy Photon Assisted Rapid Isothermal Processing Based Chemical Vapor Deposition

Singh, R. ; Sharangpani, R. ; Chen, Y.

Pub. info.:	Chemical vapor deposition : proceedings of the Fourteenth International Conference and EUROCVD-11. pp.187-193, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-25

Conference Proceedings

5. Comparison of Interface Properties of Dry and Wet Oxides Grown in Different Ambient

Sharangpani, R. ; Tay, S.P.

Pub. info.:	Rapid thermal and other short-time processing technologies II : proceedings of the international symposium. pp.157-162, 2001. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-9

Conference Proceedings

6. Rapid Thermal Processes of High Permittivity Films on Silicon for ULSI Gate Dielectrics Applications

Tay, S.P. ; Sharangpani, R. ; Hu, Y.Z.

Pub. info.:	Silicon Nitride and Silicon Dioxide Thin Insulating Films : proceedings of the sixth International Symposium. pp.109-126, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-7

Conference Proceedings

7. Direct Liquid Injection Assisted Chemical Vapor Deposition of Low Constant Materials

Sharangpani, R. ; Singh, R. ; Parihar, V. ; Thakur, R.P.S.

Pub. info.:	Proceedings of the Second International Symposium on Low and High Dielectric Constant Materials : Materials Science, Processing, and Reliability Issues. pp.15-19, 1997. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	97-8

Conference Proceedings

8. 18 CVD of Hafnium Silicate Thin films for Advanced Gate Applications

Sharangpani, R. ; Muthukrishnan, S. ; Kher, S. ; Narwankar, P. ; Goyani, T. ; Ma, Y. ; Ahmed, K. ; Conti, G.

Pub. info.:	Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.146-150, 2005. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2005-05

Conference Proceedings

9. Rapid Thermal Processing Using Steam

Sharangpani, R. ; Das, J.H. ; Tay, S.-P.

Pub. info.:	Rapid thermal and other short-time processing technologies : proceedings of the international symposium. pp.203-214, 2000. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2000-9

10.

Conference Proceedings

10. Growth and Characterization of Thin Wet Oxides Grown by Rapid Thermal Processing

Sharangpani, R. ; Das, J. ; Tay, S. P. ; Thakur, R. P. S. ; Yang, T. C. ; Saraswat, K. C.

Pub. info.:	Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A.. pp.143-, 1998. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	525

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