1.

Conference Proceedings
Conference Proceedings
1. Modeling of electromagnetic effects from mask topography at full-chip scale
Borjon, A. ; Belledent, J. ; Shang, S. D. ; Toublan, O. ; Miramond, C. ; Patterson, K. ; Lucas, K. ; Couderc, C. ; Rody, Y. ; Sundermann, F. ; Urbani, J.-C. ; Baron, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.498-505,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Model-based insertion and optimization of assist features with application to contact layers [5992-71]
Shang, S. D. ; Granik, Y. ; Swallow, L. ; Zhang, L. ; Brist, T. ; Torres, A. ; Hung, C. ; Liu, Q.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
3.

Conference Proceedings
Conference Proceedings
3. MEEF-based mask inspection
Maurer, W. ; Word, J. ; Schulze, S. F. ; Shang, S. D.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.98-106,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567