1.

Conference Proceedings
Conference Proceedings
1. Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application
Seong,N. ; Yeo,G. ; Cho,H. ; Moon,J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.30-39,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Measurement of pitch dependency of overlay errors under OAI by using an electric CD measurement technique
Seong,N. ; Kim,H. ; Cho,H.-K. ; Moon,I.-T. ; Lee,S.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1170-1174,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Patterning 220-nm pitch DRAM patterns by using double mask exposure
Nam,D. ; Seong,N. ; Cho,H. ; Moon,J. ; Lee,S.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.283-292,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement
Schoot,J.B.van ; Seong,N. ; Geh,B. ; Burkhardt,M. ; Graupner,P. ; Reisinger,G. ; Rubingh,R. ; Suddendorf,M. ; Finders,J. ; Rikkers,E.
Pub. info.: Optical Microlithography XIV.  4346  pp.229-240,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
5.

Conference Proceedings
Conference Proceedings
5. Optimal lens assignment through measured aberrations
Seong,N. ; Kang,Y.S. ; Cho,H. ; Moon,J.
Pub. info.: Optical Microlithography XIV.  4346  pp.1-7,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Modification of development parameters of 193-nm chemically amplified resist with pattern density
Seo,E.-J. ; Sohn,Y.-S. ; Bak,H.-J. ; Oh,H.-K. ; Woo,S.-G. ; Seong,N. ; Cho,H.-K.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.963-972,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345