1.

Conference Proceedings
Conference Proceedings
1. ArF excimer-laser exposure durability of chromium-fluoride-attenuated phase-shift masks
Seki,Y. ; Ushioda,J. ; Saito,T. ; Maeda,K. ; Nakano,K. ; Iwasa,S. ; Ohfuji,T. ; Tanabe,H.
Pub. info.: Photomask and X-ray mask technology IV : 17-18 April, 1997, Kawasaki, Japan.  pp.286-293,  1997.  Bellingham, Washington.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3096
2.

Conference Proceedings
Conference Proceedings
2. Two-step ablation for CVD SiO2 film by ArF excimer laser
Seki,Y.
Pub. info.: High-Power Laser Ablation.  Part 2  pp.998-1009,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3343
3.

Conference Proceedings
Conference Proceedings
3. Xe2 excimer lamp(172nm)for optical lithography
Tanabe,H. ; Seki,Y. ; Yano,J. ; Ushioda,J. ; Ogura,Y.
Pub. info.: Optical Microlithography IX.  Part2  pp.866-869,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726