1.

Conference Proceedings
Conference Proceedings
1. Electron-beam lithography method for sub-50-nm isolated trench with high aspect ratio
Yang, X.M. ; Eckert, A.R. ; Mountfield, K. ; Gentile, H. ; Seiler, C. ; Brankovic, S. ; Harris, R. ; Johns, E.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.168-177,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
2.

Conference Proceedings
Conference Proceedings
2. Three-dimensional imaging of isolated lines of negative e-beam resist
Eckert, A.R. ; Gentile, H. ; Mountfield, K. ; Seiler, C. ; Yang, X. ; Johns, E.
Pub. info.: Emerging Lithographic Technologies VII.  2  pp.1074-1083,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Electron-beam lithography of isolated trenches with chemically amplified positive resist
Eckert, A.R. ; Bojko, R.J. ; Gentile, H. ; Harris, R. ; Jayashankar, J. ; Johns, E. ; Minor, K. ; Mountfield, K. ; Seiler, C. ; Yang, X.M.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.878-887,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
4.

Conference Proceedings
Conference Proceedings
4. Resist formulation effects on contrast and top-loss as measured by 3D-SEM metrology
Eckert, A.R. ; Seiler, C. ; Brainard, R.L.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.460-467,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374