1.

Conference Proceedings
Conference Proceedings
1. Damage testing of pellicles for 193-nm lithography
Liberman,V. ; Kunz,R.R. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Grenville,A. ; Bates,A.K. ; Van,Peski,C.K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.480-495,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Long-term 193-nm laser-induced degradation of fused silica and calcium fluoride
Liberman,V. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Bates,A.K. ; Peski,C.K.Van
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1137-1145,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Long-term testing of optical components for 157-nm lithography
Liberman,V. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Bates,A.K. ; Orvek,K.J.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.488-495,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. 193-nm lithography
Rothschild,M. ; Forte,A.R. ; Horn,M.W. ; Kunz,R.R. ; Palmateer,S.C. ; Sedlacek,J.H.C.
Pub. info.: Lasers as tools for manufacturing of durable goods and microelectronics : 19 January-2 February, 1996, San Jose, California.  PartB  pp.398-404,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2703
5.

Conference Proceedings
Conference Proceedings
5. Assessment of optical coatings for 193-nm lithography
Liberman,V. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S. ; Grenville,A. ; Bates,A.K. ; Van,Peski,C.K.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.470-479,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
6.

Conference Proceedings
Conference Proceedings
6. Performance of excimer lasers as light sources for 193-nm lithography
Sedlacek,J.H.C. ; Doran,S.P. ; Fritze,M. ; Kunz,R.R. ; Rothschild,M. ; Uttaro,R.S. ; Corliss,D.A.
Pub. info.: Optical Microlithography X.  pp.874-881,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051
7.

Conference Proceedings
Conference Proceedings
7. Marathon evaluation of optical materials for 157-nm lithography
Liberman,V. ; Rothschild,M. ; Efremow Jr.,N.N. ; Palmacci,S.T. ; Sedlacek,J.H.C. ; Peski,C.K.Van ; Orvek,K.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.45-51,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
8.

Conference Proceedings
Conference Proceedings
8. Marathon damage testing of pellicles for 193-nm lithography
Grenville,A. ; Liberman,V. ; Kunz,R.R. ; Rothschild,M. ; Sedlacek,J.H.C. ; Uttaro,R.S.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.456-463,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236