1.

Conference Proceedings
Conference Proceedings
1. Pellicle-induced aberrations and apodization in hyper NA optical lithography [6283-115]
Bubke, K. ; Alles, B ; Cotte, E. ; Sczyrba, M. ; Pierrat, C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628318-628318,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data [6154-163]
Sczyrba, M. ; Kahle, R. ; Bubke, K. ; Pforr, R. ; Neubauer, R.
Pub. info.: Optical Microlithography XIX.  pp.615448-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Applicability of alternating phase shifting masks using polarized light [6154-164]
Bubke, K. ; Sczyrba, M. ; Pierrat, C
Pub. info.: Optical Microlithography XIX.  pp.615449-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Simulation of quartz phase etch affect on performance of ArF chrome-less hard shifter for 65-nm technology [5853-57]
Park, K. T. ; Sczyrba, M. ; Bubke, K. ; Pforr, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.722-730,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
5.

Conference Proceedings
Conference Proceedings
5. The importance of being homogeneous: on the influence of illumination inhomogeneity on AIMS images [5992-99]
Durr, A. C. ; Bubke, K. ; Sczyrba, M. ; Angonin, S.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59922Y-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
6.

Conference Proceedings
Conference Proceedings
6. Comparative study of simulations and experiments for contact array patterns on attenuated phase shilling mask [5992-188]
Henkel, T. ; Sczyrba, M. ; Noelscher, C.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59925G-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. Image degradation due to phase effects in chromeless phase lithography [6349-38]
Bubke, K. ; Sczyrba, M. ; Park, K. T. ; Neubauer, R. ; Pforr, R. ; Reichelt, J. ; Ziebold, R.
Pub. info.: Photomask Technology 2006.  pp.634913-634914,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
8.

Conference Proceedings
Conference Proceedings
8. Aerial image based mask defect detection in dense array structures [5853-85]
Kohle, R. ; Hennig, M. ; Pforr, R. ; Bubke, K. ; Sczyrba, M. ; Durr, A. C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.953-964,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853