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Conference Proceedings

1. Effect of nonlinear errors on 300-mm wafer overlay performance

Schmidt,S. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Scheurich,J. ; Schedel,T. ; Schuster,R.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.857-865, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Process performance comparisons on 300-mm i-line steppers,DUV stepper,and DUV scanners

Schedel,T. ; Charles,A.B. ; Ganz,D. ; Hornig,S.R. ; Hraschan,G. ; Kostler,W. ; Maltabes,J.G. ; Mautz,K.E. ; Metzdorf,T. ; Otto,R. ; Schmidt,S. ; Schuster,R.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.335-342, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. Is lithography ready for 300 mm?

Charles,A.B. ; Haris,C. ; Hornig,S.R. ; Ganz,D. ; Schedel,T. ; Hraschan,G. ; Kostler,W. ; Maltabes,J.G. ; Mautz,K.E. ; Schmidt,S. ; Schuster,R.

Pub. info.:	Challenges in process integration and device technology : 18-19 September 2000, Santa Clara, USA. pp.254-264, 2000. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4181

Conference Proceedings

4. Evaluation techniques for 300-mm equipment

Mautz,K.E. ; Morgenstern,T. ; Schuster,R.

Pub. info.:	Process Control and Diagnostics. pp.316-326, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4182

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