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Conference Proceedings

1. The prospects for hierarchical data processing with growing complexity of the post-tapeout flow

Schulze, S. ; Sahouria, E.

Pub. info.:	Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA. pp.351-360, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5756

Conference Proceedings

2. Extending OASIS for the unification of mask data representation

Sahouria, E. ; Schulze, S. ; Suzuki, T. ; Hirumi, J.

Pub. info.:	EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany. pp.51-62, 2005. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5835

Conference Proceedings

3. Raman Spectroscopy of Self-Assembled InAs Quantum Dots in Wide-Bandgap Matrices of AlAs and Aluminium Oxide

Tenne, D.A. ; Milekhin, A.G. ; Bakarov, A.K. ; Bajutova, O.R. ; Haisler, V.A. ; Toropov, A.I. ; Schulze, S. ; Zahn, D.R.T.

Pub. info.:	Quantum confined semiconductor nanostructures : symposium held December 2-5, 2002, Boston, Massachusetts, U.S.A.. pp.141-292, 2003. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	737

Conference Proceedings

4. An integrated imaging system for the 45-nm technology node contact holes using polarized OAI, immersion, weak PSM, and negative resists

Brist, T. E. ; Schulze, S.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.488-497, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

5. Low Temperature Bonding of Silicon Wafers by Sol-Gel-Processing

Schulze, S. ; Noffke, M. ; Albreeht, I. ; Benecke, W. ; Mennig, M.

Pub. info.:	Proceedings of the Second International Symposium on Microstructures and Microfabricated Systems. pp.328-336, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-27

Conference Proceedings

6. Detection of Defects at Bonded Silicon-Silicon-Interfaces by Electrical Characterization

Schulze, S. ; Albrecht, I. ; Beneeke, W.

Pub. info.:	Proceedings of the Second International Symposium on Microstructures and Microfabricated Systems. pp.319-327, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-27

Conference Proceedings

7. Investigation of Bonded Silicon-Silicon-Interfaces Using Scanning Acoustic Microscopy

Schulze, S. ; Albrecht, I. ; Kosbi, K. ; Gebhard, M. ; Benecke, W. ; Bosek, S.

Pub. info.:	Proceedings of the Second International Symposium on Microstructures and Microfabricated Systems. pp.309-318, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-27

Conference Proceedings

8. MULTILEVEL CONTACT SYSTEM WITH A THIN SILICIDE REACTION CONTROLLING INTERLAYER

Fenske, F. ; Schulze, S. ; Selle, B. ; Lange, H. ; Wolke, W.

Pub. info.:	Silicides, germanides, and their interfaces : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.427-, 1994. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	320

Conference Proceedings

9. Pattern based mask process correction: impact on data quality and mask writing time [5853-38]

Sahouria, E. ; Bowhill, A. ; Schulze, S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.564-573, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

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Conference Proceedings

10. Distributed computing in mask data preparation for 45-nm node and below [6349-142]

Zhang, W. ; Sahouria, F. ; Schulze, S.

Pub. info.:	Photomask Technology 2006. pp.63493T-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

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Author: Schulze, S.